Back to results
US 2003/0148623 A1Published application
Plasma processing device
OwnerTadahiro Ohmi, Masaki Hirayama +3inventors
InventorsTadahiro Ohmi, Masaki Hirayama, Shigetoshi Sugawa, Tetsuya Goto, Toshiaki Hongoh
Life of this patent
Estimating the term…
Abstract
In a microwave plasma processing apparatus that uses a radial line slot antenna, abnormal discharges are suppressed and the excitation efficiency of microwave plasma is improved simultaneously. In the joint between the radial line slot antenna and the coaxial waveguide, the point part of the power supplying line of the coaxial waveguide is separated from the slot plate constructing a radiation face.
Claims14
A plasma processing apparatus, comprising:
- a processing vessel defined by an outer wall and having a stage for holding a substrate to be processed;
- an evacuation system coupled to said processing vessel;
- a plasma gas supplying part for supplying plasma gas to said processing vessel;
- a microwave antenna provided on said processing vessel in correspondence to said plasma gas supplying part, said microwave antenna being supplied with electric power through a coaxial waveguide;
- and
- a microwave power source coupled to said microwave antenna electrically, said microwave antenna being defined by a first outer surface forming a microwave radiation surface and a second outer surface opposing said first outer surface;
- wherein
- an outer waveguide constructing said coaxial waveguide is coupled to said second outer surface;
- and
- a center conductor constructing said coaxial waveguide, a point part of which is separated from said first outer surface, forms capacitive coupling with said first outer surface.
7 more elements
Dependencies are inferred from the claim text.