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AssigneeSgl Carbon SE
InventorsHans-Georg Kahl, Jurgen Kessel, Helmut Schmitz-Grapp
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A highly pure, replaceable wear insert and a process for manufacturing the same use a group of materials which is suitable for meeting the requirements of high temperature semiconductor technology processes and is chosen at the same time for producing thin layers or components therefrom. The materials are compacted and purified at high temperatures in compression molds and the products so produced are put to their intended use. The substantially thin-walled and crucible-shaped, always highly pure components, which are predominantly made of expanded graphite, are employed as a wear insert for protecting graphitic support crucibles from reactive attack by quartz glass crucibles in semiconductor technology processes at temperatures above 500° C.
A process for manufacturing a highly pure, replaceable wear insert of expanded graphite to protect graphitized support crucibles against oxidative attack by quartz glass crucibles during semiconductor technology processes at temperatures exceeding 500° C., the process which comprises:
A process for manufacturing a highly pure, replaceable wear insert of expanded graphite to protect graphitized support crucibles against oxidative attack by quartz glass crucibles during semiconductor technology processes at temperatures exceeding 500° C., the process which comprises:
A replaceable wear insert, comprising:
Dependencies are inferred from the claim text.