Thin film, method and apparatus for forming the same, and electronic component incorporating the same
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsKazuyoshi Honda, Masaru Odagiri, Kiyoshi Takahashi, Noriyasu Echigo, Nobuki Sunagare
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Abstract
A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
Claims62
A method for forming a thin film, comprising the steps of:
- supplying a deposition material in the form of a liquid onto a heated surface;
- heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement;
- and
- depositing the deposition material onto a deposition surface,
- wherein the deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
A method for forming a thin film including a step of depositing a deposition material onto a deposition surface,
- wherein the method further comprises, prior to depositing the deposition material onto the deposition surface, a step of radiating a charged particle beam onto at least one of the deposition material or the deposition surface.
A method for forming a resin thin film and a metal thin film under a vacuum condition, comprising the steps of:
- forming the resin thin film;
- performing a discharge treatment by exposing the resin thin film to a discharge atmosphere containing oxygen gas;
- and
- forming the metal thin film on the resin thin film.
A method for forming a resin thin film and a metal thin film, comprising the steps of:
- depositing an ultraviolet curable resin;
- forming the cured resin thin film which is incompletely cured by radiating ultraviolet light onto the ultraviolet curable resin in a atmosphere containing oxygen gas;
- and
- forming the metal thin film on the resin thin film.
A thin film formation apparatus, comprising:
- a heater having a heated surface for heating and vaporizing a deposition material while carrying the deposition material;
- a supplier which supplies the deposition material to the heated surface;
- a support body which maintains a substrate with a deposition surface such that the deposition material which is vaporized is deposited onto the deposition surface;
- and
- a curing device which cures the deposition material on the deposition surface,
- wherein the deposition material is supplied at a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
A thin film formation apparatus, comprising:
- a first supplier which supplies a deposition material that is atomized or vaporized;
- a support body which maintains a substrate with a deposition surface such that the deposition material which is atomized or vaporized is deposited onto the deposition surface;
- and
- a device for radiating a charged particle beam onto at least one of the deposition material and the deposition surface.
A thin film formation apparatus for continuously forming a resin thin film and a metal thin film in a vacuum state, wherein the surface of the resin thin film is exposed to discharge atmosphere containing oxygen gas after the resin thin film is formed.
A thin film formation apparatus for continuously forming a resin thin film and a metal thin film in a vacuum state, comprising a UV light radiation device for radiating the surface of the resin thin film with UV light in atmosphere containing oxygen after the resin thin film is formed.
A thin film including an interface between a resin thin film and a metal thin film which are laminated, a concentration of oxygen in the vicinity of the interface between the resin thin film and the metal thin film is higher than a concentration of oxygen in a middle portion of the resin thin film in its thickness direction.
An electronic component according to claim 59, wherein the metal thin film is a stripe-like thin film.
Dependencies are inferred from the claim text.