Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same
AssigneeNikon Corporation
InventorMasayuki Shiraishi
Life of this patent
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AssigneeNikon Corporation
InventorMasayuki Shiraishi
Estimating the term…
Methods and apparatus are disclosed for peripherally supporting X-ray-reflective mirrors such as used in X-ray microlithography systems and other X-ray optical systems. The methods provide effective physical support while reducing certain deformations in the reflective surface of the mirror. An embodiment of the method or mirror-support apparatus utilizes multiple “pushing” and “pushing” devices that apply a compressive stress and tensile stress, respectively, to respective locations on the peripheral-side surface of the mirror. One or more pushing devices and one or more pulling devices can be used as required. For example, at time of mirror fabrication, respective pushing devices can be placed adjacent concave-deviation regions and respective pulling devices can be placed adjacent convex-deviation regions on the reflective surface of the mirror. (Each pushing device produces an offsetting convexity in the adjacent mirror material, and each pulling device produces a corresponding concavity in the adjacent mirror material.) Thus, form errors arising at fabrication time are offset while simultaneously supporting the mirror.
A method for supporting a reflective mirror relative to a mounting structure, the method comprising:
In an X-ray optical system comprising at least one X-ray-reflective mirror mounted to a mounting structure in an optical column, a method for reducing a form error of the mirror, the method comprising:
A mirror-support apparatus for a reflective mirror having a mirror-side surface, the apparatus comprising:
An X-ray optical system, comprising:
A microlithography system, comprising:
Dependencies are inferred from the claim text.