Cataoptric projection optical system, exposure apparatus and device fabrication method using the same
AssigneeCanon Kabushiki Kaisha
InventorChiaki Terasawa
Life of this patent
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Abstract
A cataoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.
Claims12
A cataoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image, said cataoptric projection optical system comprising first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.
An exposure apparatus comprising a cataoptric projection optical system, and irradiating a mask or reticle using circular extreme ultraviolet light corresponding to a circular field of said cataoptric projection optical system,
- wherein said cataoptric projection optical system is adapted to project a pattern on an object surface onto an image surface and serve as an imaging system that forms an intermediate image, said cataoptric projection optical system comprising first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.
A device fabricating method comprising the steps of:
- exposing an object using an exposure apparatus;
- and
- performing a predetermined process for the exposed object,
- wherein said exposure apparatus comprises a cataoptric projection optical system, and irradiates a mask or reticle using circular extreme ultraviolet light corresponding to a circular field of said cataoptric projection optical system,
- wherein said cataoptric projection optical system is adapted to project a pattern on an object surface onto an image surface and serve as an imaging system that forms an intermediate image, said cataoptric projection optical system comprising first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.
Dependencies are inferred from the claim text.