Method for the determination of layer thicknesses
AssigneeLeica Microsystems Jena GmbH
InventorsHakon Mikkelsen, Horst Engel, Joachim Wienecke
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AssigneeLeica Microsystems Jena GmbH
InventorsHakon Mikkelsen, Horst Engel, Joachim Wienecke
Estimating the term…
The invention concerns a method for the determination of layer thicknesses and optical parameters of a number of layers of a specimen, in which the reflectance spectrum of the specimen is measured and then smoothed, and a modeled reflectance spectrum is adapted to the measured one by means of an optimization criterion so as thereby to determine the layer thickness. In a method of this kind, the optimization criterion is determined by the totality of the absolute values of the wavelength differences of all pairs of wavelengths, a pair of wavelengths being constituted by those wavelengths that respectively correspond to a selected extreme in the measured reflectance spectrum characterized by an index counting the extremes in ascending or descending order, and a selected extreme in the modeled reflectance spectrum having the same index.
A method for the determination of layer thicknesses and optical parameters of a number (N) of layers of a specimen, the method comprising:
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