Particle-measuring system and particle-measuring method
AssigneeTokyo Electron Limited
InventorsHayashi Otsuki, Tsukasa Matsuda, Kyoko Ikeda
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AssigneeTokyo Electron Limited
InventorsHayashi Otsuki, Tsukasa Matsuda, Kyoko Ikeda
Estimating the term…
The present invention provides a particle measuring system which is provided in a processing system 40 which generates an atmosphere obtained by exhausting air or a gas in a processing chamber 48 by a vacuum pump 98 and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe 90 which connects an exhaust opening 86 of the processing chamber 48 with the vacuum pump 98, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.
A particle measuring system comprising:
A particle measuring system comprising:
A particle measuring system comprising:
A particle measuring system comprising:
A method of measuring particles exhausted through an exhaust duct of a processing system which generates an atmosphere by exhausting a fluid in a processing space and which applies a process to an object to be processed in the atmosphere, comprising:
A particle measuring system which generates a duct atmosphere in which a fluid flows from a processing space and which is mounted in the duct, comprising:
A particle measuring method by a system having a laser beam irradiator, a scattered light detector and a beam stopper in order to measure the number of particles by emitting a laser beam to the particles flowing through a duct through which a fluid flows in a processing space, comprising:
A method of measuring particles flowing through a duct by using a particle measuring system with a laser position adjusting unit in the duct through which a fluid in a processing space flows, comprising:
A processing system comprising:
A particle measuring system mounted in a duct through which a fluid in a processing space flows, comprising:
A method of cleaning the inside of a processing chamber in a processing system comprising:
Dependencies are inferred from the claim text.