Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method
AssigneeNikon Corporation
InventorsNoriaki Tokuda, Kenichi Shiraishi
Life of this patent
Estimating the term…
Abstract
A control system adjusts the exposure of a wafer according to the transfer error of a pattern line width caused when a certain integrated exposure over the whole shot areas is made a desired value when a pattern is transferred to a wafer and according to information corresponding to the desired value of the integrated exposure stored in a storage device, then performing scanning exposure. As a result, influences such as of fog exposure due to flare are mitigated, and the uniformity of line width distribution with high precision is ensure over the shot regions on the wafer, achieving pattern transfer to each shot region.
Claims52
A scanning exposure method of sequentially transferring a pattern formed on a mask onto a plurality of shot areas on a substrate through a projection optical system, in which said mask and said substrate are moved synchronously while illuminating said mask with an exposure light, said method comprising:
- transferring said pattern onto a specific shot area which is located at an edge of said substrate;
- and
- performing exposure amount adjustment, in a manner that an exposure amount at an edge portion of said specific shot area is different from that of a remaining portion in said specific shot area, when said specific shot area is to be exposed, said edge portion being located on a side where there is no adjacent shot area.
A scanning exposure method of sequentially transferring a pattern formed on a mask onto a plurality of shot areas on a substrate through a projection optical system, in which said mask and said substrate are moved synchronously while illuminating said mask with an exposure light, said method comprising:
- judging whether there is an adjacent shot area in a predetermined direction before transferring said pattern onto each shot area on said substrate;
- calculating a second function for exposure amount correction performed for a specific shot area where there is no adjacent shot area in said predetermined direction, by using a first function corresponding to at least one of a transmittance of said mask and an illumination condition;
- and
- transferring said pattern onto said specific shot area while controlling an exposure amount based on a calculation result obtained in said calculating.
A scanning exposure method of transferring a pattern of a mask onto a plurality of shot areas on a substrate by synchronously moving said mask and said substrate during an exposure of each of said shot areas, comprising,
- partially changing a target exposure amount with respect to said substrate while exposing a specific shot area of said plurality of shot areas where there is no adjacent shot area in a predetermined direction.
A scanning exposure method of transferring a pattern formed on a mask onto a substrate through a projection optical system while illuminating said mask with an exposure light and synchronously moving said mask and said substrate, said method comprising,
- performing exposure amount adjustment with respect to said substrate in accordance with information of a transfer error of a pattern line width in a moving direction in which said substrate is moved, when said mask and said substrate are synchronously moving to transfer said pattern on said mask onto a shot area on said substrate.
A scanning exposure method of respectively transferring a pattern of a mask onto a plurality of shot areas on a substrate by synchronously moving said mask and said substrate during an exposure of each of said shot areas, said method comprising,
- changing exposure amount control during scanning exposure, depending on whether a shot area of said plurality of shot areas lack at least one of an adjacent shot area or has all adjacent shot areas.
A scanning exposure method of respectively transferring a pattern of a mask onto a plurality of shot areas on a substrate by synchronously moving said mask and said substrate during an exposure of each of said shot areas, said method comprising,
- performing scanning exposure on a specific shot area of said plurality of shot areas while performing exposure amount control in consideration of an influence of flare.
A scanning exposure apparatus for sequentially transferring a pattern formed on a mask onto a plurality of shot areas on a substrate by synchronously moving said mask and said substrate during exposure for each of said shot areas, said apparatus comprising:
- an illumination system which includes a light source and illuminates said mask with an illumination light for exposure;
- a projection optical system to project said illumination light for exposure emitted from said mask onto said substrate;
- a mask stage to hold said mask;
- a substrate stage to hold said substrate;
- a driving unit to synchronously move said mask stage and said substrate stage;
- and
- a control unit to adjust an exposure amount in a specific shot area located at an edge portion on said substrate such that said exposure amount at said edge portion located on a side that lack an adjacent shot differs from said exposure amount at a remaining portion in said specific shot area.
A scanning exposure apparatus for transferring a pattern formed on a mask onto a substrate while synchronously moving said mask and said substrate, said apparatus comprising:
- an illumination system which includes a light source and illuminates said mask with an illumination light for exposure;
- a projection optical system to project said illumination light for exposure emitted from said mask onto said substrate;
- a mask stage to hold said mask;
- a substrate stage to hold said substrate;
- a driving unit to synchronously move said mask stage and said substrate stage;
- a storage device to store information about a pattern line width transfer error in a synchronous moving direction of said substrate;
- and
- a control unit to adjust an exposure amount in said moving direction of said substrate on exposure based on said information, when said mask and said substrate are synchronously moving to transfer said pattern on said mask onto a shot area on said substrate.
A method of making a scanning exposure apparatus for sequentially transferring a pattern formed on a mask onto a plurality of shot areas on a substrate by synchronously moving said mask and said substrate during exposure for each of said shot areas, said method comprising:
- providing an illumination system which includes a light source and illuminates said mask with an illumination light for exposure;
- providing a projection optical system to project illumination light for exposure emitted from said mask onto said substrate;
- providing a mask stage to hold said mask;
- providing a substrate stage to hold said substrate;
- providing a driving unit to synchronously move said mask stage and said substrate stage;
- and
- providing a control unit to adjust an exposure amount in a specific shot area located at an edge portion on said substrate such that said exposure amount at said edge portion located on a side that lack an adjacent shot differs from said exposure amount at a remaining portion in said specific shot area.
A method of making a scanning exposure apparatus for transferring a pattern formed on a mask onto a substrate while synchronously moving said mask and said substrate, said apparatus comprising:
- providing an illumination system which includes a light source and illuminates said mask with an illumination light for exposure;
- providing a projection optical system to project said illumination light for exposure emitted from said mask onto said substrate;
- providing a mask stage to hold said mask;
- providing a substrate stage to hold said substrate;
- providing a driving unit to synchronously move said mask stage and said substrate stage;
- providing a storage device to store information about a pattern line width transfer error in a synchronous moving direction of said substrate;
- and
- providing a control unit to adjust an exposure amount in said moving direction of said substrate on exposure based on said information, when said mask and said substrate are synchronously moving to transfer said pattern on said mask onto a shot area on said substrate.
Dependencies are inferred from the claim text.