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US 2003/0146404 A1Published application
Use of fluorinated additives in the etching or polishing of integrated circuits
AssigneeSolvay Solexis S.p.A.
InventorsMario Visca, Alba Chittofrati, Fiorenza D'Aprile
Life of this patent
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Abstract
Use in etching or polishing of integrated circuits of fluorinated additives of formula (I): T′(C3F6O)n(CFXO)mT (I) having a number average molecular weight in the range 250-400, in particular of the compound Cl(CF2—CF(CF3)O)nCF2COONa.
Claims6
Use in the etching or polishing treatments of integreated circuits of additives of formula:
- T′(C3F6O)n(CFXO)mT (I)
- wherein:
- T′=YRf(O)p wherein Y=Cl, F, H;
- Rf=C3F6, C2F4, CF2, preferably C3F6,
- p can be 0 or 1,
- n can be 0 or 1,
- m is an integer selected from 0, 1, 2,
- when p=0 also m, n=0
- X=F, CF3,
- T=—CF2COOM or —CF2SO3M with M=H, ammonium or a metal ion.
7 more elements
Compounds of formula (II)
- Cl(CF2—CF(CF3)O)nCF2COOM (II)
- wherein
- M=H, ammonium or a metal ion, preferably Li, Na or K;
- n=1.
1 more element
Dependencies are inferred from the claim text.