Polarimetric optical detector

A method of producing an optical detector as claimed in one of the preceding claims, characterized in that it comprises the following various steps:

• producing an ohmic contact layer (5) on the face of a transparent substrate;
• producing a stack (2) of layers forming a stack of quantum wells allowing a range of wavelengths to be detected, on said ohmic contact layer;
• producing a second omhic contact layer (4) on this stack of layers;
• producing a stack of a layers forming a stack of quantum wells allowing a range of wavelengths (λ) to be detected, on the second ohmic contact layer;
• producing layers of at least two diffraction gratings (3 and 3′) having different physical structures, on the surface of the second stack of layers;
• etching at least two detector elements in the assembly of layers obtained until reaching the first ohmic contact layer (5), one of the detectors having a diffraction grating oriented in a first direction and the other detector element having a diffraction grating oriented in a direction perpendicular to the first direction;
• encapsulation of the assembly in an insulating layer (6);
• etching holes in the insulating layer, which pass through the insulator and reach the diffraction gratings, and metalizing these holes so as to produce the first and second contact means (C1 and C′1);
• producing at least one hole per pair of detector elements, said hole reaching the second ohmic contact layer (4), and metalizing this hole so as to produce the third contact means (Cc);
• producing a hole passing through the insulator and reaching the first ohmic contact layer (5) and metalizing this hole so as to produce the fourth contact means (C2).