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US 2003/0146191 A1Published application
Etching method for nickel-vanadium alloy
OwnerHo-Ming Tong, Chun-Chi Lee +7inventors
InventorsHo-Ming Tong, Chun-Chi Lee, Jen-Kuang Fang, Min-Lung Huang, Jau-Shoung Chen, Ching-Huei Su, Chao-Fu Weng, Yung-Chi Lee, Yu-Chen Chou
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Abstract
A method for etching a nickel-vanadium alloy is described. The etching of the nickel-vanadium alloy is conducted using an etchant that comprises sulfuric acid. Further, the etching rate of the nickel-vanadium alloy is controlled based on the electrolytic reaction between the etchant and the nickel-vanadium alloy thin film.
Claims14
An etching method for a nickel-vanadium alloy, comprising:
- providing an etchant, which comprises at least sulfuric acid;
- and
- using the etchant to perform an etching on the nickel-vanadium alloy.
An etching method for a nickel-vanadium alloy, comprising:
- providing an etchant that comprises sulfuric acid and deionized water;
- and
- using the etchant to etch the nickel-vanadium alloy.
An etching method for a nickel-vanadium alloy, comprising:
- providing an electrolytic tank, wherein an etching solution is placed in the electrolytic tank,
- and the etching solution comprises sulfuric acid and deionized water;
- providing an anode and a cathode;
- placing a substrate material having a nickel-vanadium alloy thereon on the anode;
- and
- controlling an etching rate of the nickel-vanadium alloy by an electrolytic reaction.
3 more elements
Dependencies are inferred from the claim text.