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US 2003/0146189 A1Published application
Method of manufacturing etalon
AssigneeShimadzu Corporation
InventorsRyo Tateno, Masaru Koeda, Satoshi Irikuchi
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Abstract
In producing an etalon, a thickness of an etalon base plate is measured, and the etalon base plate is placed in a process chamber. Then, a gas having a chemical reactivity with respect to a material of the etalon base plate is introduced into the process chamber, and a surface of the etalon base plate is etched for only a predetermined time corresponding to a thickness of the etalon base plate, thereby obtaining the etalon having a desired thickness.
Claims5
A method of producing an etalon having a desired thickness, comprising the steps of:
- measuring a thickness of an etalon base plate,
- placing the etalon base plate in a process chamber,
- introducing a gas having a chemical reactivity with respect to the etalon base plate into the process chamber, and
- etching a surface of the etalon base plate by producing an ion beam of the gas for a specific time corresponding to a thickness of the etalon base plate so that the desired thickness is obtained.
1 more element
Dependencies are inferred from the claim text.