Gas supply apparatus and gas supply method
AssigneeNippon Sanso Corporation
InventorsJunichi Tanaka, Takashi Orita, Makoto Echigojima
Life of this patent
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Abstract
This gas supply apparatus supplies a gas by vaporizing a liquefied gas filled in a gas container. This apparatus includes an installation stand having an upper surface on which the gas container is placed; at least one nozzle which discharges a beating medium towards a bottom surface of the gas container and is provided in a hole formed in the installation stand; and a heating medium discharge path which discharges the heating medium from a space between the bottom surface of the gas container and the upper surface of the installation stand.
Claims8
A gas supply apparatus which supplies a gas by vaporizing a liquefied gas filled in a gas container, comprising:
- an installation stand having an upper surface on which the gas container is placed;
- at least one nozzle which discharges a heating medium towards a bottom surface of the gas container and is provided in a hole formed in the installation stand;
- and
- a heating medium discharge path which discharges the heating medium from a space between the bottom surface of the gas container and the upper surface of the installation stand.
A gas supply method comprising:
- supplying a vaporized gas while heating or cooling a gas container into which liquefied gas has been filled by a heating medium;
- measuring the pressure and flow rate of the vaporized gas flowing out from the gas container;
- regulating the temperature of the heating medium based on the difference between the measured flow rate of the vaporized gas and a reference flow rate when the measured flow rate is outside an allowed range of flow rate fluctuation predetermined with respect to a reference flow rate, and
- regulating the temperature of the heating medium based on the difference between the measured pressure and a reference pressure when the measured flow rate is within the allowed range of flow rate fluctuation relative to the reference flow rate.
A gas supply method comprising:
- supplying a vaporized gas while heating or cooling a gas container into which liquefied gas has been filled by a heating medium;
- measuring the pressure and flow rate of the vaporized gas flowing out from the gas container;
- regulating the temperature of the heating medium based on the difference between the measured flow rate and a reference flow rate when the measured pressure is lower than a lower limit pressure predetermined with respect to a reference pressure, and
- regulating the temperature of the heating medium based on the difference between the measured pressure and a reference pressure when the measured pressure is equal to or greater than the lower limit pressure.
Dependencies are inferred from the claim text.