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AssigneeSamsung Electronics Co., Ltd.
InventorsDong-Gyun Han, Kun-Tack Lee, Yong-Pil Han, Hyung-Ho Ko
Estimating the term…
An apparatus for cleaning a semiconductor wafer includes a cleaning reaction chamber wherein the cleaning process is performed in a closed state, a wafer conveyor having wafer supporters for loading semiconductor onto a loading unit within the reaction chamber, at least one cleaning gas supply unit for supplying at least one cleaning solution in a vapor state into the reaction chamber, a water vaporizing unit for supplying vapor onto the semiconductor wafers, an ozone supply unit for supplying ozone gas into the reaction chamber, and a reaction gas exhaustion unit connected to the reaction chamber in order to exhaust the cleaning gas from the reaction chamber. The cleaning of the semiconductor wafers by adding cleaning gas and ozone gas into a reaction chamber easily removes any remaining photoresist that formed on the semiconductor wafers and any other contaminates from pre-processes.
An apparatus for cleaning a semiconductor wafer, the apparatus comprising:
A method for cleaning a semiconductor wafer using an apparatus for cleaning a semiconductor wafer, the apparatus includes a reaction chamber, a wafer conveyor for loading semiconductor wafers onto a loading unit inside the reaction chamber, a cleaning gas supply unit for supplying vaporized cleaning solution into the reaction chamber, an ozone gas supply unit for supplying ozone gas into the reaction chamber, and a gas exhaustion unit for exhausting the gases from the reaction chamber, the method comprising:
Dependencies are inferred from the claim text.