Method of using photolithography and etching for forming a nozzle plate of an inkjet print head
AssigneeNanodynamics, Inc.
InventorsKung Linliu, Ming-Hsun Yang, Arnold Chang-mou Yang, Guey-Chyuan Chen, Chih-Chieh Hsu
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Abstract
A method of forming a nozzle plate of an inkjet print head. A silicon chip is provided with an activated device and a first film is formed on the silicon chip, with a first opening corresponding to the activated device. Then, a second film is formed on the first film. Next, a photoresist layer is formed on the second film, such that the photoresist layer has a second opening corresponding to the first opening. Next, the second film under the second opening of the photoresist layer is etched to form a via in the second film passing through the first opening.
Claims9
A method of forming a nozzle plate of an inkjet print head, comprising the steps of:
- providing a silicon chip having at least one activated device thereon;
- forming a first film on the silicon chip, in which the first film comprises a first opening corresponding to the activated device;
- forming a second film on the first film;
- forming a photoresist layer on the second film, in which the photoresist layer comprises a second opening corresponding to the first opening;
- and
- etching the second film under the second opening of the photoresist layer to form a via in the second film, passing through the first opening.
Dependencies are inferred from the claim text.