Composition and method for removing copper-compatible resist
AssigneeLG.Philips LCD Co., Ltd.
InventorsGee-Sung Chae, Yong-Sup Hwang, Cyoo-Chul Jo, Oh-Nam Kwon, Kyoung-Mook Lee, Byung-Uk Kim, Sang-Dai Lee, Jong-Soon Yoo
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Abstract
A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.
Claims14
A composition for removing a copper-compatible resist, comprising:
- about 10% to about 30% by weight of an amine compound;
- about 10% to about 80% by weight of a glycolether compound;
- and
- about 10% to about 80% by weight of a polar solvent.
A method for removing a copper-compatible resist including combining about 10% to about 30% by weight of an amine compound with about 10% to about 80% by weight of a glycolether compound and about 10% to about 80% by weight of a polar solvent.
Dependencies are inferred from the claim text.