Mask forming and removing method, and a semiconductor device, an electric circuit, a display module, a color filter and an emissive device manufactured by the same method

1) a mask forming method comprising:

• a mask-material layer forming step of forming a lyophobic mask-material layer over an entire surface of a member to be processed so as to form a desired pattern using liquid material for pattering;
• a patterning step of patterning by removing the mask-material layer in a pattern-formation area;
• a film forming step of forming the desired pattern by coating the liquid material for pattering;
• a heating step of drying and baking the liquid material for patterning;
• and
• a mask removing step of removing a mask, wherein;
• an electric current is conducted to a conductive material pattern formed on the surface of the member to be processed in electrolytic solution, thereby electrolyzing and removing the mask-material layer on the conductive material pattern in the patterning step.