Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

A method for the formation of a negative resist pattern, comprising the following steps:

• coating a negative resist composition onto a target substrate,
• selectively exposing the formed resist film to image-forming radiation that can induce decomposition of the photo acid generator of said resist composition, and
• developing the exposed resist film with a basic aqueous solution;
• said resist composition comprising:
• (1) a film-forming polymer which is itself soluble in basic aqueous solutions, and contains a first monomer unit with an alkali-soluble group and a second monomer unit with an alcohol structure capable of reacting with said alkali-soluble group, and
• (2) a photo acid generator which, when decomposed by absorption of image-forming radiation, is capable of generating an acid that can induce reaction between the alcohol structure of said second monomer unit and the alkali-soluble group of said first monomer unit, or protect the alkali-soluble group of said first monomer unit,
• and being itself soluble in basic aqueous solutions but, upon exposure to said image-forming radiation, being rendered insoluble in basic aqueous solutions at its exposed sections as a result of the action of said photo acid generator.