Dieletric thin films from fluorinated benzocyclobutane precursors
AssigneeDielectric Systems, Inc.
InventorChung J. Lee
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Abstract
New precursors and processes are provided to generate fluorinated low dielectric constant, ε films that have higher dimensional stability and more rigid than fluorinated Poly (Para-Xylylenes). The low ε films are prepared primarily from polymerization of precursors consisting of both benzocyclobutane and unsaturated carbon-carbon groups such as vinyl (C═C) and ethylenic groups. The low ε polymers consists primarily of SP2C—F, hyperconjugated Sp3Cα—F type or/and Sp3Siα—F fluorine. The low ε (<2.4) films are useful for fabrications of future<0.18 μm ICs. Using low ε films prepared according to this invention, the integrity of dielectric, Cu and its barrier metals such as Ta can be kept intact; therefore reliability of these ICs can be assured.
Claims19
A dielectric thin film prepared from a precursor of a general structure (I):
- Y-Z-Si(R′R″)—Ar—{Si(R″″R′″)-Z′-Y′}n°−1 (I)
- wherein, Y and Y′ are the same or different benzocyclobutane moieties;
- Z and Z′ are the same or different, and individually a olefinic (“C═C”) group, or an ethylenic (“C≡C”) unsaturated carbon-carbon containing group;
- R′, R″, R′″ and R″″ are the same or different, and individually a —F, a fluorinated alkyl group, or a fluorinated phenyl group;
- Ar is an aromatic group moiety having a general structure:
- —C6H4-nFn-(n=0 to 4);
- C6H4-nFn—CF2C6H4-nFn-(n=0 to 8);
- —C10H6-nFn-(n=0 to 6);
- —C12H8-nFn-(n=0 to 8)-C12H8-nFn;—C14H8-nFn;—C16H8-nFn;
- —C16H10-nFn—;
- or —O—;
- and
- n° is an integer of at least 1 but no more than a total number of sp2C—H substitution on the fluorinated-aromatic-group-moiety.
A dielectric thin film prepared from a precursor of a general structure (II):
- Y-Z-C(X′X″)—Ar—{C(X″″X′″)-Z′-Y′}n°−1 (II)
- wherein, Y and Y′ are the same or different benzocyclobutane moieties;
- Z and Z′ are the same or different, and individually a vinyl, olefinic (“C═C”) group, or an ethylenic (“C≡C”) unsaturated carbon-carbon containing group;
- X′, X″, X′″ and X″″ are the same or different, and individually a fluorine, a fluorinated alkyl group, or a fluorinated phenyl group;
- Ar is an aromatic group moiety having a general structure:
- —C6H4-nFn-(n=0 to 4);
- C6H4-nFn—CF2—C6H4-nFn-(n=0 to 8);
- —C10H6-nFn-(n=0 to 6);—C12H8-nFn-(n=0 to 8)-C12H8-nFn;—C14H8-nFn;—C16H8-nFn;
- —C16H10-nFn—;
- or —O—;
- and
- n° is an integer of at least 2 but no more than a total number of sp2C—H substitution on the fluorinated-aromatic-group-moiety.
Dependencies are inferred from the claim text.