Back to results
US 2003/0143333 A1Published application
Film production method and film-element production method
AssigneeMurata Manufacturing Co., Ltd.
InventorMitsutoshi Kawamoto
Life of this patent
Estimating the term…
Abstract
A method for producing a lead ferroelectric film having high relative dielectric constant and low dielectric loss by a hydrothermal process is disclosed. The method includes the step of hydrothermally forming a ferroelectric layer on a substrate, followed by the step of hydrothermally treating the resulting film in an aqueous solution having a pH of about 5 to 7.
Claims16
A film production method comprising:
- subjecting a hydrothermally formed film to hydrothermally processing in an aqueous solution having a pH of about 5 to 7.
A film production method comprising:
- forming a ferroelectric seed film comprising at least one of the metals to be contained in a ferroelectric film on a substrate;
- immersing the substrate in an aqueous solution comprising the metal elements of the ferroelectric film to hydrothermally form a ferroelectric film;
- and
- hydrothermally processing the resulting ferroelectric film in an aqueous solution having a pH of about 5 to 7.
1 more element
Dependencies are inferred from the claim text.