Dielectric recording medium, and method of and apparatus for producing the same

A method of producing a dielectric recording medium for recording information in a dielectric material or reproducing the information comprising:

• a mask pattern formation process of forming a mask pattern for setting an area for recording in the dielectric material;
• a first etching process of etching the dielectric material to be in a predetermined depth according to the formed mask pattern;
• a conductive thin film formation process of forming a conductive thin film over the whole surface etched by said first etching process;
• an adhesion process of sticking a surface on which the conductive thin film is formed to a substrate;
• a second etching process of etching the dielectric material from an opposite surface to a surface of the dielectric material adhering to the substrate;
• a measurement process of measuring an amount etched by said second etching process;
• and
• a control process of controlling said second etching process on the basis of an etching amount measured by said measurement process.

An apparatus for producing a dielectric recording medium for recording information in a dielectric material or reproducing the information comprising:

• a mask pattern formation device for forming a mask pattern for setting an area for recording in the dielectric material;
• a first etching device for etching the dielectric material to be in a predetermined depth according to the formed mask pattern;
• a conductive thin film formation device for forming a conductive thin film over the whole surface etched by said first etching device;
• an adhesion device for sticking a surface on which the conductive thin film is formed to a substrate;
• a second etching device for etching the dielectric material from an opposite surface to a surface of the dielectric material adhering to the substrate;
• a measurement device for measuring an amount etched by said second etching device;
• and
• a control device for controlling said second etching device on the basis of an etching amount measured by said measurement device.