Method of manufacturing micro-lens array, electrolyte and manufacturing apparatus used therefor
AssigneeFuji Xerox Co., Ltd.
InventorsShigemi Ohtsu, Keishi Shimizu, Kazutoshi Yatsuda, Eiichi Akutsu
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Abstract
A method includes the steps of disposing a substrate having a conductive thin film and a photo-semiconductor thin film in this order on an insulative base in an aqueous electrolyte material that solubility is lowered by a change of pH, irradiating with light a selected region of the photo-semiconductor thin film and precipitating the material to the selected region of the photo-semiconductor thin film to form a micro-lens array layer.
Claims21
A method of manufacturing a micro-lens array comprising the steps of:
- disposing a substrate having a conductive thin film and a photo-semiconductor thin film in this order on an insulative base in an aqueous electrolyte containing a film-forming material of which solubility or dispersibility to an aqueous liquid is lowered by a change of pH, with the photo-semiconductor thin film being in contact with an electrolyte;
- irradiating with light a selected region of the photo-semiconductor thin film to apply a voltage between the photo-semiconductor thin film in the selected region and a counter electrode;
- and
- precipitating the material to the selected region of the photo-semiconductor thin film to form a micro-lens array layer.
A method of manufacturing a micro-lens array comprising the steps of:
- disposing a substrate in which a conductive thin film and a photo-semiconductor thin film in contact with the conductive thin film are formed on an insulative base and the conductive thin film is in electrical conduction with an electrolyte to an aqueous electrolyte containing a film-forming material of which solubility or dispersibility to an aqueous liquid is lowered by a change of pH, with the photo-semiconductor thin film being in contact with the electrolyte;
- irradiating with light a selected region of the photo-semiconductor thin film in a state where the photo-conductive thin film is in electrical conduction with the electrolyte;
- and
- precipitating the material to the selected region of the photo-semiconductor thin film to form a micro-lens array layer.
An apparatus for manufacturing a micro-lens array, comprising:
- an exposure device having at least a light source for applying light and a focusing optical system having a first focusing optical lens and a second focusing optical lens;
- a photo-mask interposed between the first focusing optical lens and the second focusing optical lens;
- a counter electrode;
- a unit capable of applying a bias voltage;
- and
- an electrodeposition vessel containing an electrolyte,
- wherein a micro-lens array preparing substrate is disposed in the electrodeposition vessel such that at least a photo-semiconductor thin film thereof is in contact with the electrolyte.
An apparatus for manufacturing a micro-lens array, comprising:
- an exposure device having at least a light source for applying light and a mirror reflection optical system;
- a counter electrode;
- a unit capable of applying a bias voltage;
- and
- an electrodeposition vessel containing an electrolyte,
- wherein a micro-lens array preparing substrate is disposed in the electrodeposition vessel such that at least a photo-semiconductor thin film thereof is in contact with the electrolyte.
An apparatus for manufacturing a micro-lens array, comprising:
- a parallel irradiation type or close contact type exposure device;
- a counter electrode;
- a unit capable of applying a bias voltage;
- and
- an electrodeposition vessel containing an electrolyte,
- wherein a micro-lens array preparing substrate is disposed in the electrodeposition vessel such that at least a photo-semiconductor thin film thereof is in contact with the electrolyte.
An apparatus for manufacturing a micro-lens array, comprising:
- a laser beam exposure device;
- a counter electrode;
- a unit capable of applying a bias voltage;
- and
- an electrodeposition vessel containing an electrolyte,
- wherein a micro-lens array preparing substrate is disposed in the electrodeposition vessel such that at least a photo-semiconductor thin film thereof is in contact with the electrolyte.
An optical part comprising:
- a conductive thin film disposed on an insulative base;
- a photo-semiconductor thin film disposed in contact with the conductive thin film;
- and
- a lens formed on the photo-semiconductor thin film.
Dependencies are inferred from the claim text.