Multilayer film optical filter, method of producing the same, and optical component using the same

A method of producing a multilayer film optical filter comprising a first step of forming a relaxation layer on a surface of a substrate, for relaxing the influence of an error in thickness measurement due to a temperature change, and a second step of alternately laminating thin films of two dielectric materials having different refractive indexes on the upper surface of the relaxation layer, wherein the first step is continuously performed until the initial temperature of the substrate increases to a substantially stationary value, and the second step is performed at the substantially stationary value after the first step.

A multilayer film optical filter comprising a substrate and a multilayer film formed on a surface of the substrate, wherein the multilayer film comprises a first deposited layer formed on the surface of the substrate, and a second deposited layer formed on the first deposited layer, wherein the first deposited layer comprises at least one sub-layer having a thickness of an integral multiple of λ/4 based on a predetermined wavelength λ, and the second deposited layer comprises at least one sub-layer having a thickness of a non-integral multiple of λ/4 based on the wavelength λ.

A method of producing a multilayer film optical filter comprising the step of forming, on a surface of a substrate, a first deposited layer comprising at least one sub-layer having a thickness of an integral multiple of λ/4 based on a predetermined wavelength λ, and the step of forming, on the first deposited layer, a second deposited layer comprising at least one sub-layer having a thickness of a non-integral multiple of λ/4 based on the wavelength λ.