Optical power limiting material
OwnerMasanori Ando, Kenji Kamada +4inventors
InventorsMasanori Ando, Kenji Kamada, Kohei Kadono, Koji Ohta, Keiko Tawa, Takeyuki Tanaka
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OwnerMasanori Ando, Kenji Kamada +4inventors
InventorsMasanori Ando, Kenji Kamada, Kohei Kadono, Koji Ohta, Keiko Tawa, Takeyuki Tanaka
Estimating the term…
A main object of the present invention is to provide a novel optical power limiting material of high performance being less susceptible to damages caused by heat occurring when an intensified laser beam is irradiated, having reversible characteristic and exhibiting a stable optical power limiting effect; production of the optical power limiting is simple and economical. The optical power limiting material of the present invention comprises a transparent substrate and an oxide(s) of at least one metal selected from the group consisting of of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Nb, Mo, Ru, In, Sn, Sb, Ta, W, Re, Os, Ir and Bi.
An optical power limiting material comprising a transparent substrate and an oxide of at least one metal selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Nb, Mo, Ru, In, Sn, Sb, Ta, W, Re, Os, Ir and Bi,
An optical power limiting material comprising a transparent substrate and an oxide of at least one metal selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Nb, Mo, Ru, In, Sn, Sb, Ta, W, Re, Os, Ir and Bi, wherein the oxide of vanadium is not VO2, wherein the metal oxide is at least one composite oxide selected from the group consisting of XCr2O4, wherein X=Mg, Zn, Cu, Mn, Fe, Co, or Ni, Na2SnO3, Pb2SnO4, Bi2Sn2O7, Na3VO4, MVO4, wherein M=Nd, Sm, Eu, Y, Fe, or Cr, VOMo4, MV2O4, wherein M=Mg, Mn, Co, Zn, or Cu, VM2O4, wherein M=Mg, Co, or Zn, VMn2O4, V2MoO8, AxV2O5, wherein 0<x<1, A=Li, K, Na, Cu, Ag, Ca, Cd, or Pb, ZrV2O7, MVO3, wherein M=K, Fe, Ti, Cr, Ni, Mg, Ca, La, Y, or Sc, H4(PMo11VO40), H5(PMo10V2O40), H6(PMo9V3O40), H4(PW11VO40), H6(PW6V3O41), Bi2O3.xMoO3, wherein x=4, 3, 2, 1, ½, ⅓, or {fraction (1/10)}, Bi2O3.xWO3, wherein x=2-3, 1, ½, to ⅕, or {fraction (1/10)}, xBi2O3Sb2O5, wherein x=1, 3, Bi9PMo12O52, Fe2(MoO4)3, (MoO3)1.0(Cr2O3)0.75, AxWO3, wherein 0<x<1, A=H, Li, K, Na, Rb, Ca, Cu, Ag, In, Tl, Sn, Pb, or rare earth element, LiTi2O4, MnCo2O4, NiCo2O4 and NiMnCo4O8.
An optical power limiting material comprising a transparent substrate and an oxide of at least one metal selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Nb, Mo, Ru, In, Sn, Sb, Ta, W, Re, Os, Ir and Bi, wherein the oxide of vanadium is not VO2, and wherein the metal oxide forms a thin film on a surface of the transparent substrate in the form of particles having a mean particle diameter of not more than 1 μm, and a ratio of a number of metal atoms in the metal oxide to a number of non-oxygen atoms in the oxide comprised in the transparent substrate or a number of monomer units composing a polymer ranges from 1:1 to 1:100.
An optical power limiting material comprising a transparent substrate and an oxide of at least one metal selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Nb, Mo, Ru, In, Sn, Sb, Ta, W, Re, Os, Ir and Bi, wherein the oxide of vanadium is not VO2, and wherein the metal oxide is dispersed in the transparent substrate in the form of particles having a mean particle diameter of not more than 1 μm, and a ratio of a number of metal atoms in the metal oxide to a number of non-oxygen atoms in the oxide comprised in the transparent substrate or a number of monomer units composing a polymer ranges from 1:1 to 1:100.
A method of forming an optical power limiting material, said method comprising:
A method of forming an optical power limiting material, said method comprising:
Dependencies are inferred from the claim text.