Method of manufacturing semiconductor device and apparatus of automatically adjusting semiconductor pattern

An apparatus of automatically adjusting a semiconductor exposure pattern for use in a process of manufacturing a semiconductor device comprising the steps of:

• a first patterning step including a step of exposing a first pattern on a semiconductor substrate in a shape adjusted with a first degree of freedom;
• and
• a second patterning step including a step of exposing a second pattern, while said second pattern is aligned with said first pattern, in a shape adjusted with a second degree of freedom equal to or lower than said first degree of freedom in said first patterning step with an exposure method different from that in said first exposure step,
• the apparatus comprising:
• pattern measuring means for measuring a difference in the shape and/or position between said first pattern and said second pattern;
• and
• pattern adjusting means for relying on said difference to adjust the shape of a first pattern in a successive first patterning step performed after the first patterning step in which said difference is measured.