Exposure method and apparatus
AssigneeNikon Corporation
InventorKenji Nishi
Life of this patent
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AssigneeNikon Corporation
InventorKenji Nishi
Estimating the term…
A high exposure accuracy is obtained while mitigating the influence of vibration by using an exposure method and an exposure apparatus. Columns (59A, 59B) are installed on a base plate (12), a reticle base (62) is supported at the inside of the columns (59A, 59B) by the aid of variable mount sections (61A, 61B) having high rigidity, a finely movable stage (63) is movably placed on the reticle base (62) by the aid of air bearings, and a reticle (R1) as an exposure objective is placed on the finely movable stage (63). A coarsely movable stage (64) is hung on a bottom surface of a support plate (66) arranged over the reticle base (62) in a state capable of being driven in a scanning direction. The finely movable stage (63) is driven by the coarsely movable stage (64) in the scanning direction in a non-contact state with respect to the reticle base (62). The finely movable stage (63) is finely driven with respect to the coarsely movable stage (64) by an actuator arranged between the coarsely movable stage (64) and the finely movable stage (63).
An exposure method for exposing a second object with an exposure light beam via a pattern of a first object, the exposure method comprising:
An exposure apparatus for exposing a second object with an exposure light beam via a pattern of a first object, the exposure apparatus comprising:
An exposure apparatus for exposing a second object with an exposure light beam passing through a first object, the exposure apparatus comprising:
A method for producing an exposure apparatus for exposing a second object with an exposure light beam via a pattern of a first object, the method comprising:
An exposure method for exposing a second object with an exposure light beam via a pattern of a first object, the exposure method comprising:
An exposure apparatus for exposing a second object with an exposure light beam via a pattern of a first object, the exposure apparatus comprising:
A method for producing an exposure apparatus for exposing a second object with an exposure light beam passing through a pattern of a first object, the method comprising:
Dependencies are inferred from the claim text.