Particle tolerant architecture for feed holes and method of manufacturing

A method of manufacturing a fluid ejection device comprising:

• applying a mesh pattern over a front side of a substrate opposite a back side, wherein the mesh pattern defines at least two apertures therein, and wherein the mesh pattern is substantially more resistant to an etchant than the substrate material;
• and
• DRIE etching the substrate and the mesh pattern with an etchant from the front side to form a trench partially through the substrate in each of the at least two apertures of the mesh pattern, wherein a wall is formed in between each of the adjacent trenches;
• and
• isotropically etching the wall formed in between each of the adjacent trenches to form one large trench in the substrate bordered on one side by the mesh pattern.

A method of manufacturing a fluid ejection device comprising:

• forming depressions in a first side of a substrate;
• depositing in the depressions a first material surrounded by a second material to form an etch stop in each of the depressions;
• and
• etching the substrate with an etchant to form a fluid slot through the substrate, wherein each of the depressions form part of a particle tolerant architecture within the fluid slot.