Multi-beam shaped beam lithography system

A shaped-beam electron beam system for simultaneously directing a set of N individually controllable shaped beams (where N is at least two) on a workpiece, comprising:

• an electron gun for generating and directing an initial beam along an axis at a first set of N shaping apertures, disposed about said axis and each separated from one another transversely by a first separation distance, thereby generating a set of N sub-beams separated by said separation distance;
• a first stage comprising a first set of individually controllable deflectors for positioning said N sub-beams with respect to a second set of N shaping apertures to form said set of N sub-beams into a set of N shaped sub-beams, separated from one another transversely by individual separation distances;
• a second stage comprising a second set of N individually controllable deflectors for positioning said set of N sub-beams transversely to form a Kth transverse intensity distribution of N spots positioned relative to one another corresponding to a Kth pattern to be imposed on said workpiece;
• a third stage comprising a set of controllable collective deflectors for positioning said Kth transverse intensity distribution of N spots at a controllable Kth location on said workpiece.