Simplified reticle stage removal system for an electron beam system
AssigneeNikon Corporation
InventorsW. Thomas Novak, Douglas C. Watson
Life of this patent
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Abstract
A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.
Claims20
A lithography system, comprising:
- a reticle chamber having a reticle chamber opening;
- a reticle chamber maintenance panel which is removably mounted to the reticle chamber opening;
- and
- a reticle stage housed within the reticle chamber and accessible and removable through the reticle chamber opening.
A lithography system, comprising:
- a reticle chamber having a reticle chamber angled opening,
- a reticle chamber maintenance panel which is removably mounted to the reticle chamber angled opening;
- an optical system for illuminating and projecting a source;
- a reticle stage having a reticle table, the reticle table positioned between components of the optical system and housed with the reticle stage within the reticle chamber,
- wherein the reticle chamber angled opening provides access to the reticle stage.
Dependencies are inferred from the claim text.