Exhaust system for processing apparatus

An exhaust system for a processing apparatus for subjecting an object to be processed to a predetermined processing with a processing gas, said exhaust system comprising:

• a vacuum exhaust pathway connected to said processing apparatus;
• a vacuum pump provided in said vacuum exhaust pathway, for evacuating said processing apparatus;
• a trap mechanism for removing reaction products that are generated within said processing apparatus and flow into said vacuum exhaust pathway, said trap mechanism being provided within said vacuum exhaust pathway, so as to divide the pathway into an upstream-side section and a downstream-side section;
• an upstream connection device for removably linking an inlet portion of said trap mechanism to said upstream-side section of the exhaust pathway;
• a downstream connection device for removably linking an outlet portion of said trap mechanism to said downstream-side section of the exhaust pathway;
• an inlet-side isolation valve and an outlet-side isolation valve connected in a closable manner to said inlet portion and said outlet portion of said trap mechanism, for placing an interior of said trap mechanism in a hermetically sealed state;
• and
• a bypass pathway for connecting said upstream-side section and said downstream-side section of the vacuum exhaust pathway, bypassing said upstream connection device, said trap mechanism, and said outlet-side isolation valve, to allow a cleaning gas to bypass said trap mechanism and flow through said vacuum exhaust pathway during the cleaning of said processing apparatus.