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US 2003/0140806 A1Published application
Multi-beam pattern generator
AssigneeMicronic Laser Systems AB
InventorTorbjorn Sandstrom
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AssigneeMicronic Laser Systems AB
InventorTorbjorn Sandstrom
Estimating the term…
A scanning pattern generator and a method for microlithographic multi-beam writing of high precision patterns on a photosensitive substrate (11), the system comprising a light source (1), preferably a laser, for generating at least two light beams, a computer-controlled light modulator (4), a deflector for scanning the beams on the substrate and an objective lens (10) to contract the at least one light beam from the light source before it reaches the substrate, wherein at least the objective lens is arranged on a carrier (22) being movable relative to the substrate (11) and the light source (1). Hereby, the carrier defines a movable optical path relative to the remaining, stationary optical path. Further, the system comprises means for altering the stationary optical path in order to maintain telecentricity for the beams as they impinge on the photosensitive substrate during the movement of the carrier and the movable optical path.
A scanning pattern generator for microlithographic multi-beam writing of high precision patterns on a photosensitive substrate (11), the system comprising a light source (1), preferably a laser, for generating at least two light beams, a computer-controlled light modulator (4), a deflector for scanning the beams on the substrate and an objective lens (10) to contract the at least one light beam from the light source before it reaches the substrate, wherein at least the objective lens is arranged on a carrier (22) being movable relative to the substrate (11) and the light source (1), wherein the carrier defines a movable optical path relative to the remaining, stationary optical path, characterised in that it further comprises means for altering the stationary optical path in order to maintain telecentricity for the beams as they impinge on the photosensitive substrate during the movement of the carrier and the movable optical path.
A system according to any one of the preceding claims, wherein the deflector (6) is arranged on the carrier, and the means for altering the stationary optical path are arranged to make the beams coincide in the deflector.
A system according to anyone of the preceding claims, wherein the modulator is an acousto-optic modulator.
A system according to anyone of the preceding claims, wherein the deflector is an acousto-optic deflector.
A method for scanning microlithographic multi-beam writing of high precision patterns on a photosensitive substrate (10) with at least two light beams emitted from a light source (1) and controlled by a computer-controlled light modulator (4), a deflector for scanning the beams on the substrate and an objective lens to contract the at least one light beam from the light source before it reaches the substrate, wherein at least the objective lens is arranged on a carrier (22) being movable relative to the substrate (11) and the light source (1), wherein the carrier defines a movable optical path relative to the remaining, stationary optical path, characterised in that it further comprises the steps of altering the stationary optical path in order to maintain telecentricity for the beams as they impinge on the photosensitive substrate during the movement of the carrier and the movable optical path.
Dependencies are inferred from the claim text.