Method for inspecting accuracy in stitching pattern elements using CAD or pattern reference data

A method of inspecting accuracy at which desired regions are stitched on a material on which regions are exposed successively to form a pattern are stitched, said method comprising the steps of:

• establishing an inspected area over plural different exposed regions, said inspected area containing at least two pattern positions at which a certain pattern appears;
• detecting a signal arising from the inspected area and detecting said pattern positions from said detected signal;
• correcting first data about the reference area corresponding to said inspected area by the use of second data made ancillary to said first data to thereby find pattern positions within the reference area at which the certain pattern appears;
• and
• comparing the pattern positions within said inspected area with found pattern positions.

A method of inspecting accuracy at which desired regions are stitched on a material on which regions are exposed successively to form a pattern are stitched, said method comprising the steps of:

• establishing an inspected area over plural different exposed regions, said inspected area containing at least two pattern positions at which a certain pattern appears;
• creating a reference image based on data about a reference area corresponding to said inspected area;
• bisecting a whole field of view of said reference image into subfields of view;
• setting a frame having a given size around center of each of said subfields of view;
• detecting pattern positions within each frame at which a certain pattern appears;
• detecting a signal produced from said inspected area and forming an inspected image;
• detecting pattern positions within the inspected area corresponding to the certain pattern within each set frame in said reference image;
• and
• comparing each pattern position within said inspected area with a respective one of pattern positions within said reference area.