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US 2003/0125511 A1Published application
Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist compositon comprising the same
AssigneeSumsung Electronics Co., Ltd.
InventorsSang-Jun Choi, Joo-Tae Moon, Sang-Gyun Woo, Kwang-Sub Yoon, Ki-Yong Song
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Abstract
A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows: 1 wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms.
Claims52
A photosensitive polymer having a repeating unit which comprises:
- 18
- wherein R1 is a hydrogen atom or methyl group, and R2 is a hydrocarbon group having a fluorinated ethylene glycol group having 3 to 10 carbon atoms.
A photosensitive polymer having a structural formula comprising:
- 19
- wherein R1 is a hydrogen atom or methyl group, and R2 is a hydrocarbon group having a fluorinated ethylene glycol group having 3 to 10 carbon atoms, and
- wherein R3 is a hydrogen atom, a methyl group or a trifluoromethyl group, R4 is a hydrogen atom, a hydroxy group, an alkyl group, a fluorinated alkyl group, an alkoxy group, an aldehyde group, an ester group, a nitrile group or a sulfonic acid group, and m/(m+n)=0.1-0.6, and n/(m+n)=0.4-0.9.
A photosensitive polymer having a structural formula comprising:
- 20
- wherein R1 is a hydrogen atom or methyl group, and R2 is a hydrocarbon group having a fluorinated ethylene glycol group having 3 to 10 carbon atoms, and
- wherein R5 is a hydrogen atom, a hydroxy group, a substituted or unsubstituted hydrocarbon group having 1 to 10 carbon atoms or a fluorinated alkyl hydrocarbon group having 1 to 10 carbon atoms, and m/(m+o)=0.1-0.6, and o/(m+o)=0.4-0.9.
A photosensitive polymer having a structural formula comprising:
- 21
- wherein R1 is a hydrogen atom or methyl group, and R2 is a hydrocarbon group having a fluorinated ethylene glycol group having 3 to 10 carbon atoms, and
- wherein R6 is a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, R7 and R8 are independently a hydrogen atom, a hydroxy group, a nitrile group, a substituted or unsubstituted hydrocarbon group having 1 to 10 carbon atoms, a fluorinated alkyl group having 1 to 10 carbon atoms, an alkoxy group or an ester group, and n/(m+n+p+q)=0.01-0.4, n/(m+n+p+q)=0.1-0.5, p/(m+n+p+q)=0.0-0.4, and q/(m+n+p+q)=0.0-0.4, and p/(m+n+p+q) and q/(m+n+p+q) are both not 0.0.
A resist composition comprising:
- (a) a photosensitive polymer having a repeating unit which comprises:
- 22
- wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms;
- (b) a photoacid generator (PAG);
- and
- (c) an organic base.
3 more elements
A resist composition comprising:
- (a) a photosensitive polymer having a structural formula:
- 23
- wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms, and
- wherein R3 is a hydrogen atom, a methyl group or a trifluoromethyl group, R4 is a hydrogen atom, a hydroxy group, an alkyl group, a fluorinated alkyl group, an alkoxy group, an aldehyde group, an ester group, a nitrile group or a sulfonic acid group, and m/(m+n)=0.1-0.6, and n/(m+n)=0.4-0.9,
- (b) a photoacid generator (PAG);
- and
- (c) an organic base.
4 more elements
A resist composition comprising:
- (a) a photosensitive polymer having a structural formula comprising:
- 24
- wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms, and
- wherein R5 is a hydrogen atom, a hydroxy group, a substituted or unsubstituted hydrocarbon group having 1 to 10 carbon atoms or a fluorinated alkyl hydrocarbon group having 1 to 10 carbon atoms, and m/(m+o)=0.1-0.6, and o/(m+o)=0.4-0.9,
- (b) a photoacid generator (PAG);
- and
- (c) an organic base.
4 more elements
A resist composition comprising:
- (a) a photosensitive polymer having a structural formula comprising:
- 25
- wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms, and
- wherein R6 is a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms, R7 and R8 are independently a hydrogen atom, a hydroxy group, a nitrile group, a substituted or unsubstituted hydrocarbon group having 1 to 10 carbon atoms, a fluorinated C1-C10 alkyl group, an alkoxy group or an ester group, and m/(m+n+p+q)=0.01-0.4, n/(m+n+p+q)=0.1-0.5, p/(m+n+p+q)=0.0-0.4, and q/(m+n+p+q)=0.0-0.4 with the proviso that p/(m+n+p+q) and q/(m+n+p+q) are both not 0.0,
- (b) a photoacid generator (PAG);
- and
- (c) an organic base.
4 more elements
Dependencies are inferred from the claim text.