Spin-on-glass anti-reflective coatings for photolithography
AssigneeHoneywell International Inc.
InventorsTeresa Baldwin, Joseph Kennedy, Nigel Hacker, Richard Spear
Life of this patent
Estimating the term…
Abstract
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
Claims40
An absorbing spin-on-glass composition comprising a siloxane polymer and an incorporatable organic absorbing compound that strongly absorbs light over at least an approximately 10 nm wide wavelength range, the range at wavelengths less than about 375 nm.
A film comprising an absorbing spin-on-glass composition, the composition comprising a siloxane polymer and an incorporatable organic absorbing compound that strongly absorbs light over at least an approximately 10 nm wide wavelength range, the range at wavelengths less than about 375 nm.
An integrated circuit device comprising an absorbing spin-on-glass composition, the composition comprising a siloxane polymer and an incorporatable organic absorbing compound that strongly absorbs light over at least an approximately 10 nm wide wavelength range, the range at wavelengths less than about 375 nm.
A method of making an absorbing spin-on-glass composition comprising:
- combining one or more silane reactants selected from the group consisting of alkoxysilanes and halosilanes, one or more incorporatable organic absorbing compounds, an acid/water mixture, and one or more solvents to form a reaction mixture;
- and
- refluxing the reaction mixture to form the absorbing spin-on-glass composition.
A method of making an absorbing spin-on-glass composition comprising:
- combining one or more alkoxysilanes, or, one or more halosilanes;
- one or more incorporatable organic absorbing compounds;
- and one or more solvents to form a first reaction mixture;
- refluxing the first reaction mixture;
- adding an acid/water mixture to the first reaction mixture to form a second reaction mixture.
- refluxing the second reaction mixture to form the absorbing spin-on-glass composition.
A method of making a coating solution containing an absorbing spin-on-glass polymer comprising:
- combining one or more alkoxysilanes, or, one or more halosilanes;
- one or more incorporatable organic absorbing compounds;
- an acid/water mixture;
- and one or more solvents to form a reaction mixture;
- and
- refluxing the reaction mixture to form an absorbing spin-on-glass polymer;
A method of making an absorbing spin-on-glass composition comprising:
- combining a polar solvent, a non-polar solvent and a phase transfer catalyst to form a first reaction mixture;
- adding an organotrihalosilane, a hydridohalosilane, and one or more incorporatable organic absorbing compounds to the first reaction mixture to form a second reaction mixture;
- and
- allowing the second reaction mixture to react to form the absorbing spin-on-glass composition.
An organic absorbing compound comprising the chemical composition 9-anthracene carboxy-methyl triethoxysilane.
A process of making 9-anthracene carboxy-methyl triethoxysilane comprising:
- combining 9-anthracene carboxylic acid, chloromethyltriethoxysilane, triethylamine, and a solvent to form a reaction mixture;
- refluxing the reaction mixture;
- cooling the refluxed reaction mixture to form a precipitate and a remaining solution;
- and
- filtering the remaining solution to produce liquid 9-anthracene carboxy-methyl triethoxysilane.
Dependencies are inferred from the claim text.