Resist composition
AssigneesSumitomo Chemical Company, Limited, Dongwoo Fine-Chem Co., Ltd.
InventorsSang Tae Kim, Seung Jin Kang, Shi Jin Sung, Masumi Suetsugu, Airi Yamada
Life of this patent
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Abstract
A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing excellent resist performances, and comprising a compound of the general formula (I): 1 wherein, R1 and R2 represent each independently a hydrogen atom or an alkyl group, R3 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group, n represents an integer of 1 to 40, m represents an integer of 1 to 5, and l represents an integer of 1 to 5, is provided.
Claims10
A resist composition comprising a compound of the general formula (I):
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- wherein, R1 and R2 represent each independently a hydrogen atom or an alkyl group, R3 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group provided that the alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group may be optionally substituted with a carboxy group, oxycarbonyl group, hydroxy group, alkoxy group or alkyl group, n represents an integer of 1 to 40, m represents an integer of 1 to 5, and l represents an integer of 1 to 5.
Dependencies are inferred from the claim text.