Process for producing nanoporous dielectric films at high pH
OwnerStephen Wallace, Douglas M. Smith +4inventors
InventorsStephen Wallace, Douglas M. Smith, Teresa Ramos, Kevin H. Roderick, James S. Drage, Lisa Beth Brungardt
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Abstract
The present invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. A precursor of an alkoxysilane, and low and high volatility solvents are mixed at a pH of about 2-5, raised to a pH of about 8 or above with a low volatility base and deposited on a semiconductor substrate. After exposure to atmospheric moisture, a nanoporous dielectric film is produced on the substrate.
Claims24
A process for forming a nanoporous dielectric coating on a substrate which comprises the steps of:
- (a) blending at least one alkoxysilane with a relatively high volatility solvent composition, a relatively low volatility solvent composition, and optional water to thus form a mixture having a pH of about 2 to about 5, and causing a partial hydrolysis and partial condensation of the alkoxysilane;
- (b) adding a sufficient amount of a base to the result of step (a) to raise the pH of the mixture to about 8 or above;
- (c) depositing the raised pH mixture resulting from step (b) onto a substrate while evaporating at least a portion of the relatively high volatility solvent composition;
- (d) exposing the result from step (c) to a water vapor;
- and
- (e) evaporating the relatively low volatility solvent composition.
A semiconductor device produced by the process which comprises the steps of:
- (a) blending at least one alkoxysilane with a relatively high volatility solvent composition, a relatively low volatility solvent composition, and optional water to thus form a mixture having a pH of about 2 to about 5, and causing a partial hydrolysis and partial condensation of the alkoxysilane;
- (b) adding a sufficient amount of a base to the result of step (a) to raise the pH of the mixture to about 8 or above;
- (c) depositing the raised pH mixture resulting from step (b) onto a substrate while evaporating at least a portion of the relatively high volatility solvent composition;
- (d) exposing the result from step (c) to a water vapor;
- and
- (e) evaporating the relatively low volatility solvent composition.
Dependencies are inferred from the claim text.