Plasma processing apparatus, and cleaning method therefor
AssigneeTokyo Electron Limited
InventorToshiaki Fujisato
Life of this patent
Estimating the term…
Abstract
There is provided a gas exhaustion pipe which is directly connected to a diffusion member which diffuses a process gas and is formed inside an upper electrode which serves as a shower head. A cleaning gas exhaustion line whose one end is constituted by the gas exhaustion pipe is connected to a gas exhaustion line which is connected to a gas exhaustion port and exhausts gas inside a chamber. A cleaning gas supplied from a cleaning gas line is exhausted from the chamber through the inside of the upper electrode.
Claims22
A plasma processing apparatus comprising:
- a chamber;
- a process gas line which supplies a predetermined process gas into said chamber;
- a diffusion electrode to which high frequency electricity can be applied, and which includes:
- a diffusion path which is connected to said process gas line for diffusing the process gas introduced through said process gas line;
- and a plurality of gas holes which are connected to said diffusion path for supplying the process gas diffused by said diffusion path into said chamber;
- a cleaning gas line which supplies a cleaning gas for cleaning the inside of said chamber into said chamber;
- and
- a cleaning gas exhaustion line one end of which is connected to at least one of said process gas line and said diffusion path, the other end of which is connected to a gas exhaustion mechanism, and which exhausts the cleaning gas in said chamber.
A plasma processing apparatus comprising:
- a chamber;
- a cleaning gas line which supplies a cleaning gas for cleaning the inside of said chamber into said chamber;
- a cleaning gas inlet port which has an opening communicated with the inside of said chamber, and is connected to said cleaning gas line, the cleaning gas being introduced into said chamber through said opening;
- and
- an opening and closing member which can open or close said cleaning gas inlet port.
A plasma processing apparatus comprising:
- a chamber;
- a cleaning gas line which supplies a cleaning gas for cleaning the inside of said chamber;
- and a cleaning gas inlet port which is provided to said chamber for introducing the cleaning gas supplied from said cleaning gas line into said chamber,
- wherein:
- said cleaning gas inlet port is provided with a lid having a plurality of openings, and introduces the cleaning gas supplied from said cleaning gas line into said chamber through said plurality of openings;
- and
- said plurality of openings are formed so that cleaning gas flows which pass through said respective openings may not interfere with each other.
A method of cleaning a plasma processing apparatus for cleaning a plasma processing apparatus which comprises:
- a chamber;
- a process gas line which supplies a predetermined process gas into said chamber;
- and a diffusion electrode to which high frequency electricity can be applied, and which includes a diffusion path which is connected to said process gas line for diffusing the process gas introduced through said process gas line and a plurality of gas holes which arc connected to said diffusion path for supplying the process gas diffused by said diffusion path into said chamber, said method comprising:
- an introducing step of introducing a cleaning gas into said chamber;
- and
- a gas exhausting step of exhausting the cleaning gas introduced into said chamber out of said chamber through at least one of said process gas line and said diffusion path.
A method of cleaning a plasma processing apparatus for cleaning a plasma processing apparatus which comprises:
- a chamber;
- a cleaning gas line which supplies a cleaning gas for cleaning the inside of said chamber into said chamber;
- a cleaning gas inlet port which has an opening communicated with the inside of said chamber, and is connected to said cleaning gas line, the cleaning gas being introduced into said chamber through said opening;
- and an opening and closing member which can open or close said cleaning gas inlet port,
- wherein plasma processing is performed while said cleaning gas inlet port is closed by said opening and closing member, and cleaning is performed while said cleaning gas inlet port is opened by said opening and closing member.
Dependencies are inferred from the claim text.