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US 2003/0119282 A1Published application
Method for producing semiconductor fine particles
OwnerTakayasu Yamazakiinventor
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OwnerTakayasu Yamazakiinventor
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Disclosed is a method for producing semiconductor fine particles comprising a step of preparing two or more solutions each containing at least one element selected from Group II to Group VI and feeding the solutions to an addition tank with mixing the two or more solutions fed to the addition tank by stirring to produce fine particles. In this production method, (1) flows of different rotational directions are formed by stirring the two or more solutions fed to the addition tank, and/or (2) a solvent is introduced into the addition tank beforehand, a mixing chamber having an opening is disposed below liquid surface of the solvent in the addition tank, and the two or more solutions are fed to the mixing chamber with controlling flow rates of the solutions. According to this production method, semiconductor fine particles having uniform grain sizes can be produced in a simple and convenient manner.
A method for producing semiconductor fine particles comprising a step of preparing two or more solutions each containing at least one element selected from Group II to Group VI and separately or simultaneously feeding the solutions to an addition tank with mixing the two or more solutions fed to the addition tank by stirring to produce fine particles comprising two or more elements selected from Group II to Group VI, which satisfies the following Requirements (1) and/or (2).
Dependencies are inferred from the claim text.