Simulation-based feed forward process control
AssigneeNumerical Technologies, Inc.
InventorJ. Tracy Weed
Life of this patent
Estimating the term…
Abstract
A method of optimizing a wafer fabrication process for a given mask is provided. The method includes capturing an image of a mask and simulating a wafer image of the mask. A mask map of information can then be generated based on the simulated wafer image. The resulting mask map can be provided to any downstream wafer fabrication process when such process involves the mask. One or more one input parameters to the downstream wafer fabrication process can be changed based on the mask map, thereby optimizing the process for the given mask.
Claims31
A method of manufacturing an integrated circuit according to a first process designed for processing masks within a first specification using a first mask within the first specification, the first process having at least one of a first set of lithographic parameters, a first set of resist parameters, and a first set of etch parameters, the method comprising:
- generating a first mask map for the first mask using a computer system and a simulation performed using at least the first set of lithographic parameters;
- determining, using the first mask map, whether the first set of lithographic parameters are acceptable;
- generating a second set of lithographic parameters and a second mask map responsive to the determining such that the second set of lithographic parameters are acceptable, the second set of lithographic parameters distinct from the first set of lithographic parameters;
- identifying the first mask on a stepper;
- configuring the stepper according to the second set of lithographic parameters;
- and
- exposing a wafer to electromagnetic radiation according to the second set of lithographic parameters.
A method of providing information to downstream wafer fabrication processes, the method comprising:
- capturing an image of a mask;
- simulating a wafer image of the mask;
- generating a mask map of information based on the simulating;
- and
- providing the mask map to a downstream wafer fabrication process when such process involves the mask.
A method of optimizing a wafer fabrication process for a mask, the method comprising:
- capturing an image of a mask;
- simulating a wafer image of the mask;
- generating a mask map of information based on the simulating;
- providing the mask map to a downstream wafer fabrication process when such process involves the mask;
- and
- changing at least one input parameter to the downstream wafer fabrication process based on the mask map.
A system of providing information to downstream wafer fabrication processes, the system comprising:
- means for capturing an image of a mask;
- means for simulating the image as it would appear on a wafer;
- means for generating a mask map of information based on the simulating;
- and
- means for providing the mask map to a downstream wafer fabrication process when such process involves the mask.
An input file to a wafer fabrication process, the input file including:
- simulation information regarding a mask used in the wafer fabrication process, wherein the simulation information customizes one or more input parameters to the wafer fabrication process.
A computer program product comprising:
- a computer usable medium having a computer readable program code embodied therein for causing a computer to provide information to downstream wafer fabrication processes, the computer readable program code comprising:
- computer readable program code that captures an image of a mask;
- computer readable program code that simulates a wafer image of the mask;
- computer readable program code that generates a mask map of information based on the wafer image;
- and
- computer readable program code that provides the mask map to a downstream wafer fabrication process when such process involves the mask.
Dependencies are inferred from the claim text.