Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakanobu Takeda, Osamu Watanabe, Kazunori Maeda, Hiroshi Miyakoshi
Life of this patent
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Abstract
Resist compositions comprising as the base resin a polymer using tert-amyloxystyrene as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution in the baking temperature range of 100-110° C. which is unachievable with tert-butoxystyrene. The compositions are best suited as a chemically amplified resist material for micropatterning in the manufacture of VLSI.
Claims6
A resist composition comprising a polymer comprising recurring units of the following general formula (1) and having a weight average molecular weight of 1,000 to 500,000,
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- wherein R1 is hydrogen, hydroxy, a straight or branched alkyl group, halogen atom or trifluoromethyl group, R2 is hydrogen, hydroxy, a halogen atom or trifluoromethyl group, and n is 0 or a positive integer of 1 to 4.
A resist composition comprising a polymer comprising recurring units of the following general formula (2) and having a weight average molecular weight of 1,000 to 500,000,
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- wherein each of R1 and R3 is hydrogen, hydroxy, a straight or branched alkyl group, halogen atom or trifluoromethyl group, R2 is hydrogen, hydroxy, a halogen atom or trifluoromethyl group, R4 is hydrogen, halogen atom, trifluoromethylhydroxymethyl group or —OR, R is a straight, branched or cyclic alkyl group which may contain a hetero atom, alkoxyalkyl group, alkoxycarbonyl group or trialkylsilyl group, R5 is hydrogen or methyl, R6 is hydrogen, methyl, alkoxycarbonyl group, cyano group, halogen atom, or trifluoromethyl group, R7 is a straight, branched or cyclic alkyl group of 4 to 30 carbon atoms, n is 0 or a positive integer of 1 to 4, m is 0 or a positive integer of 1 to 5, each of p, r and s is 0 or a positive number, and q is a positive number.
Dependencies are inferred from the claim text.