Photomask, production method of semiconductor laser element, and semiconductor laser element

Abstract

A photomask used in a process of producing a semiconductor laser element which has window regions at its opposite end faces and an electrode on an upper surface thereof between the window regions, the photomask being used for forming electrode pattern segments at a predetermined position over a laser substrate which includes a plurality of element regions, which will be element bodies of the semiconductor laser element, in a matrix pattern and a plurality of window region pattern stripes corresponding to the window regions of the element regions, the electrode pattern segments being used for forming electrodes at predetermined positions between the adjacent window region pattern stripes, wherein the photomask includes: an electrode pattern region for forming the electrode pattern segments; and an auxiliary mask having a scale section for measuring the amount of alignment deviation of the electrode pattern segments with respect to the window region pattern, the scale section being positioned so as to obliquely overlap the window region pattern stripes.

Dependencies are inferred from the claim text.