Film-forming cosmetic composition
OwnerFrederic Auguste, Valerie De La Poterie +1inventors
InventorsFrederic Auguste, Valerie De La Poterie, Emmanuelle Portois
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Abstract
A composition comprising, in a physiologically acceptable medium, at least one hydrophobic film-forming polymer and at least one ionic surfactant exhibiting a variation in conductivity in water, at a concentration of 2% by weight in water, of at least 100 μS/cm in a temperature range of from 20° C. to 45° C., for producing a composition, such as a film, deposited on a keratin material, which can be removed as make-up from the keratin material with hot water. The application of the make-up composition to, and the care of a keratin material.
Claims80
A make-up composition for deposit on a keratin material, comprising, in said composition, a physiologically acceptable medium, at least one hydrophobic film-forming polymer, and at least one ionic surfactant exhibiting a variation in conductivity in water, at a concentration of 2% by weight in water, of at least 100 μS/cm in a temperature range of from 20° C. to 45° C., wherein said deposited composition is removable from the keratin material with hot water.
A mascara for deposit on a keratin material, comprising, in said mascara, a physiologically acceptable medium, at least one hydrophobic film-forming polymer, and at least one ionic surfactant exhibiting a variation in conductivity in water, at a concentration of 2% by weight in water, of at least 100 μS/cm in a temperature range of from 20° C. to 45° C., wherein said deposited mascara is removable from the keratin material with hot water.
A cosmetic composition comprising, in a cosmetically acceptable medium, at least one hydrophobic film-forming polymer and at least one ionic surfactant of formula (I):
- 5
- wherein,
- R1 is chosen from alkyl radicals having from 16 to 20 carbon atoms,
- R2 is chosen from H and —CH3,
- M is chosen from H, Na, K, NH4, (HOCH2CH2)3NH, and (HOCH2CH2)2NH2.
A mascara comprising, in said mascara, a cosmetically acceptable medium, at least one hydrophobic film-forming polymer, and at least one ionic surfactant of formula (I):
- 6
- wherein,
- R1 is chosen from alkyl radicals having from 16 to 20 carbon atoms,
- R2 is chosen from H and —CH3,
- M is chosen from H, Na, K, NH4, (HOCH2CH2)3NH, and (HOCH2CH2)2NH2.
A method for application of a make-up to, or non-therapeutic care of, a keratin material comprising depositing on the keratin material a composition comprising, in a physiologically acceptable medium, at least one hydrophobic film-forming polymer and at least one ionic surfactant exhibiting a variation in conductivity in water, at a concentration of 2% by weight in water, of at least 100 μS/cm in a temperature range of from 20° C. to 45° C., wherein the deposited composition is removable from the keratin material with hot water.
A method for application of a make-up to, or non-therapeutic care of, a keratin material comprising depositing on the keratin material a composition comprising, in a cosmetically acceptable medium, at least one hydrophobic film-forming polymer and at least one ionic surfactant of formula (I):
- 7
- wherein,
- R1 is chosen from alkyl radicals having from 16 to 20 carbon atoms,
- R2 is chosen from H and —CH3,
- M is chosen from H, Na, K, NH4, (HOCH2CH2)3NH, and (HOCH2CH2)2NH2.
A method for making up a keratin material comprising depositing on the keratin material a make up composition comprising, in a physiologically acceptable medium, at least one hydrophobic film-forming polymer and at least one ionic surfactant exhibiting a variation in conductivity in water, at a concentration of 2% by weight in water, of at least 100 μS/cm in a temperature range of from 20° C. to 45° C., wherein the deposited make up composition is resistant to cold water and/or is removable from the keratin material with hot water.
A method for making up a keratin material comprising depositing on the keratin material a make up composition comprising, in a cosmetically acceptable medium, at least one hydrophobic film-forming polymer and at least one ionic surfactant of formula (I):
- 8
- wherein,
- R1 is chosen from alkyl radicals having from 16 to 20 carbon atoms,
- R2 is chosen from H and —CH3,
- M is chosen from H, Na, K, NH4, (HOCH2CH2)3NH, and (HOCH2CH2)2NH2,
- wherein the deposited make up composition is resistant to cold water and/or is removable from the keratin material with hot water.
A method for removing make-up from a keratin material,
- comprising rinsing at least once, with hot water at a temperature of from 35° C. to 50° C., a keratin material bearing a deposit of a make-up comprising a physiologically acceptable medium, at least one hydrophobic film-forming polymer, and at least one ionic surfactant exhibiting a variation in conductivity in water, at a concentration of 2% by weight in water, of at least 100 μS/cm in a temperature range of from 20° C. to 45° C.
A method for removing make-up from a keratin material,
- comprising rinsing at least once, with hot water at a temperature of from 35° C. to 50° C., a keratin material bearing a deposit of a make-up comprising a physiologically acceptable medium, at least one hydrophobic film-forming polymer, and at least one ionic surfactant of formula (I):
- 9
- wherein,
- R1 is chosen from alkyl radicals having from 16 to 20 carbon atoms,
- R2 is chosen from H and —CH3,
- M is chosen from H, Na, K, NH4, (HOCH2CH2)3NH, and (HOCH2CH2)2NH2.
A process for manufacturing a cosmetic composition for deposit on a keratin material comprising including in the composition at least one hydrophobic film-forming polymer, and at least one ionic surfactant exhibiting a variation in conductivity in water, at a concentration of 2% by weight in water, of at least 100 μS/cm in a temperature range of from 20° C. to 45° C., wherein said deposit is removable from the keratin material with hot water.
A process for manufacturing a cosmetic composition comprising including in the composition at least one hydrophobic film-forming polymer, and at least one ionic surfactant of formula (I):
- 10
- wherein,
- R1 is chosen from alkyl radicals having from 16 to 20 carbon atoms,
- R2 is chosen from H and —CH3,
- M is chosen from H, Na, K, NH4, (HOCH2CH2)3NH, and (HOCH2CH2)2NH2.
Dependencies are inferred from the claim text.