Process for making light waveguide element
AssigneeOki Electric Industry Co., Ltd.
InventorYutaka Uno
Life of this patent
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Abstract
A process for making a light waveguide element is made by forming only an upper clad layer (40) and a core layer (32) without etching an optical axis height-adjusting sections. By using plasma chemical vapor deposition (CVD) which is good at controlling the film thickness, it is possible to provide without difficulty a light waveguide element with a height-adjusting section that has a precise film thickness, making it possible to provide precise optical axis vertical alignment upon mounting. By forming alignment markers in the same photolithography as that of the core formation, it is possible to provide precise horizontal optical axis alignment.
Claims8
A process for making a light waveguide element mounted on a mount board along with an optical fiber and photoelectric components, comprising:
- forming a core as a light path on a substrate serving as a lower clad layer;
- and
- forming a T-shaped upper clad layer having a central section elevated from opposite-side optical axis height-adjusting sections to cover said core.
Dependencies are inferred from the claim text.