Micromirror actuator and manufacturing method thereof

A method of manufacturing a micromirror actuator, the method comprising:

• (a) coating a wafer with photoresist, patterning a trench region, and forming a trench using an etching process;
• (b) depositing a first metal layer on the wafer including the trench, forming lower and side electrodes at the bottom and sidewall of the trench using an etching process, and forming a base electrode outside the trench;
• (c) stacking a film-type organic layer on the resultant structure formed in step (b) and laminating the organic layer by applying heat and pressure;
• (d) etching the organic layer to form holes for first holes;
• (e) depositing a second metal layer on the resultant structure formed in step (d) and forming first posts, first torsion bars, and plates using an etching process;
• (f) coating the second metal layer with photoresist and etching the photoresist to form holes for second posts;
• (g) depositing a third metal layer on the photoresist, patterning second posts, second torsion bars, and micromirror by an etching process, and removing the photoresist and the organic layer.