X-ray fluorescense spectrometer

An X-ray fluorescence spectrometer for measuring intensities of secondary X-rays emitted from a sample, which includes a single layered thin film or a multi-layered thin film formed independently or on a substrate, by irradiating the sample with primary X-rays, said apparatus comprising:

• a measuring line evaluating means for calculating, for each specified secondary X-ray line, at a thickness and a composition specified for each of the layers of the thin film, at least two numerical values from five numerical values including an overall intensity that is a theoretical intensity from the sample in its entirety;
• a layer intensity that is a theoretical intensity from the substrate or each layer in the thin film;
• a single layer intensity that is a theoretical intensity exclusive of absorption by the upper layers from the layer intensity;
• an attenuation ratio that is obtained by dividing the layer intensity by the single layer intensity;
• a ratio to infinite thickness that is a ratio of the single layer intensity at the specified thickness to the single layer intensity when the layer is deemed having infinite thickness in terms of X-rays, and to select comments from pre-stored comments for the analysis based on the calculated numerical values;
• and
• a display control means for causing a display unit to provide an indication of the numerical values and the comments both calculated and selected by the measuring line evaluating means.