Projection aligner
AssigneePENTAX Corporation
InventorsYoshinori Kobayashi, Shigetomo Ishibashi, Masato Hara
Life of this patent
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AssigneePENTAX Corporation
InventorsYoshinori Kobayashi, Shigetomo Ishibashi, Masato Hara
Estimating the term…
The projection aligner transfers a mask pattern formed on a mask to a substrate. A collimated light beam is emitted from a light source toward the mask. The light beam passed through the mask is deflected by a first mirror formed on a deflector toward a lens unit having a positive power. A reflector is provided at the other side of the lens unit to reflect back the light beam passed through the lens unit. The light beam reflected by the reflector passed through the lend unit again and then deflected by a second mirror formed on the deflector toward the substrate to form an image of the mask pattern. The size of the image formed on the substrate is adjusted by moving the reflector along the optical axis of the lens unit, and the deflector along the optical path of the light beam passed through the mask.
A projection aligner for transferring an image of a mask having a predetermined pattern onto an object to be exposed, said projection aligner comprising:
A projection aligner for transferring an image of a pattern formed on a mask to an object to be exposed, said projection aligner comprising:
Dependencies are inferred from the claim text.