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US 2003/0116721 A1Published application
Electron beam drawing apparatus
AssigneeHitachi High-Technologies Corporation
InventorHiroyuki Ito
Life of this patent
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Abstract
To provide an electron beam drawing apparatus capable of drawing the grating pitch of a fine diffraction grating pattern highly precisely. An objective lens is constructed of lenses of two stages, and an object deflector is disposed over the objective lens of the lower stage. The power of the objective lens of the lower stage is changed to change the deflection width of the object deflector, and the power of the objective lens of the upper stage is changed to form the image on a sample plane thereby to make a focusing.
Claims4
An electron beam drawing apparatus comprising:
- an electron source for generating an electron beam;
- a reducing lens group for reducing said electron beam;
- an objective lens group for converging the reduced shaped beam on a sample plane;
- an object deflector for deflecting said shaped beam at a desired position on said sample plane;
- a stage control circuit for moving and positioning the sample stage within the deflection range of said object deflector by detecting the position of the sample stage mounting said sample;
- and a deflection control circuit for deflecting said shaped beam to expose said sample to a desired pattern,
- wherein said objective lens group includes lenses of two stages, so that the power of the objective lens of the lower stage is changed to change the deflection range of said object deflector and so that the power of the objective lens of the upper stage is changed to form the image on said sample plane, thereby to make a focusing.
4 more elements
Dependencies are inferred from the claim text.