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AssigneeSony Corporation
InventorsMasanobu Yamamoto, Hiroshi Kawase, Jun Sasaki, Minoru Takeda, Gakuo Komatsubara, Mitsuru Koizumi, Setsuo Norioka, Naoki Date
Estimating the term…
An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
An electron beam irradiation system comprising:
An electron beam irradiation system comprising:
A method of directing an electron beam at a target by the use of an electron beam irradiation system having a rotary stage capable of detachably holding the target thereon, an electron optical microscope column for shooting the electron beam at said target held on said rotary stage, a pumping block mounted at an end of said microscope column to evacuate air in a gap between said microscope column and said target, and a moving mechanism for sliding said rotary stage relative to said microscope column radially of said rotary stage between a working position where said target held on said rotary stage is opposite to said microscope column and a mounting position where said target held on said rotary stage is spaced from said microscope column, said method comprising the steps of:
Dependencies are inferred from the claim text.