Device for x-ray lithography

Abstract

An invention relates to a contact lithography device and comprises a soft X-ray source (preferable as an X-ray tube 1 with a rotating anode), a half lens 2 for a divergent radiation of this source transforming to a quasi-parallel one (the said lens includes a set of channels for a radiation transporting with total external reflection, the said channels are oriented along a generatrix of barrel-shaped surfaces), the means for placing a mask 3 and a substrate 4 with a resist 5 applied on it (the said means are placed on the output face side of a half lens 2), and an absorbing filter 6 for smoothing a nonuniformity of a beam intensity of an emergent radiation of a half lens, presenting in intensity decreasing as from the center to the periphery of a beam. An absorbing filter 6 is placed between the radiation source 1 and the input face of a half lens 2, and a relationship of cross sizes of a half lens and its focal distance from the input side is chosen so that to provide a capture angle of a source radiation in the following limits: 0.7/E1.5≦ψ≦1.3/E1.5, where ψ is an angle of a radiation capture [rad]; E is radiation energy of the used source [keV]. A material, reflecting surface of the channels for a radiation transporting is made of, includes elements with an atomic number not more than 22, and radiation energy of the used source is 0.6-6 keV. Owing to the increased capture angle and an absorbing filter placing before the input of a half lens an efficiency of a source radiation using increases and simultaneously an area of a plate-substrate under processing magnifies and lens longevity increases.

Dependencies are inferred from the claim text.