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US 2003/0113672 A1Published application
Method of forming photoresist pattern using hot plate oven
AssigneeHynix Semiconductor Inc.
InventorsJin Soo Kim, Jae Chang Jung, Ki Soo Shin
Life of this patent
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Abstract
A hot plate oven used in a thermal process of forming an ultrafine photoresist pattern and a method of forming a pattern using the same. More particularly, a hot plate oven used to flow photoresist under the high pressure in the sealed oven during a resist flow process.
Claims10
A hot plate oven comprising a gas inlet/vent member, a gas inlet/vent closing member for closing the gas inlet/vent member so that inside of the hot plate can be isolated from outside, and a pressuring member for pressurizing inside of the hot plate oven.
A sealed-type hot plate oven comprising a pressuring member.
Dependencies are inferred from the claim text.